DocumentCode
2930512
Title
Edge chemistry engineering of graphene nanoribbon transistors: A computational study
Author
Ouyang, Yijian ; Yoon, Youngki ; Guo, Jing
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Florida, Gainesville, FL
fYear
2008
fDate
15-17 Dec. 2008
Firstpage
1
Lastpage
4
Abstract
Using the density-functional theory (DFT) simulation and a top-of-the-barrier ballistic transport model, we present a simulation framework for assessing the performance limits of graphene nanoribbon (GNR) FETs with edges terminated by different chemical species. We find significant effects of edge chemistry on the quantum capacitance, carrier injection velocity, channel conductance and balance between the nFET and the pFET of GNRFETs. The H termination is identified to have the largest on current, carrier injection velocity, and the best balance between the nFET and the pFET with typical solid state gating technologies.
Keywords
carbon; density functional theory; field effect transistors; nanostructured materials; C; carrier injection velocity; channel conductance; density-functional theory; edge chemistry engineering; graphene nanoribbon transistors; quantum capacitance; top-of-the-barrier ballistic transport model; Ballistic transport; Chemical engineering; Chemical technology; Computational modeling; Computer simulation; FETs; Photonic band gap; Plasma chemistry; Quantum capacitance; Solid state circuits;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 2008. IEDM 2008. IEEE International
Conference_Location
San Francisco, CA
ISSN
8164-2284
Print_ISBN
978-1-4244-2377-4
Electronic_ISBN
8164-2284
Type
conf
DOI
10.1109/IEDM.2008.4796739
Filename
4796739
Link To Document