• DocumentCode
    2930512
  • Title

    Edge chemistry engineering of graphene nanoribbon transistors: A computational study

  • Author

    Ouyang, Yijian ; Yoon, Youngki ; Guo, Jing

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Florida, Gainesville, FL
  • fYear
    2008
  • fDate
    15-17 Dec. 2008
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Using the density-functional theory (DFT) simulation and a top-of-the-barrier ballistic transport model, we present a simulation framework for assessing the performance limits of graphene nanoribbon (GNR) FETs with edges terminated by different chemical species. We find significant effects of edge chemistry on the quantum capacitance, carrier injection velocity, channel conductance and balance between the nFET and the pFET of GNRFETs. The H termination is identified to have the largest on current, carrier injection velocity, and the best balance between the nFET and the pFET with typical solid state gating technologies.
  • Keywords
    carbon; density functional theory; field effect transistors; nanostructured materials; C; carrier injection velocity; channel conductance; density-functional theory; edge chemistry engineering; graphene nanoribbon transistors; quantum capacitance; top-of-the-barrier ballistic transport model; Ballistic transport; Chemical engineering; Chemical technology; Computational modeling; Computer simulation; FETs; Photonic band gap; Plasma chemistry; Quantum capacitance; Solid state circuits;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2008. IEDM 2008. IEEE International
  • Conference_Location
    San Francisco, CA
  • ISSN
    8164-2284
  • Print_ISBN
    978-1-4244-2377-4
  • Electronic_ISBN
    8164-2284
  • Type

    conf

  • DOI
    10.1109/IEDM.2008.4796739
  • Filename
    4796739