Two-dimensional field mapping in MMIC-substrates by electro-optic sampling technique

A system for two-dimensional field mapping in MMIC (monolithic microwave integrated circuit) substrates using direct electrooptic sampling is introduced. Measurements up to 8.5 GHz have been made. The main application of the field mapping technique is the analysis of complex MMICs. The proposed test technique is characterized by the fact that, due to the small laser beam, a high spatial resolution and a high temporal resolution (<5 ps) can be reached, allowing testing in a contactless and noninvasive manner. It offers a quick survey of the actual internal field distributions, thus making control of the simulation procedure possible. It is evident that by these means easy failure and function analysis within a MMIC can be achieved, leading to significant reduction of the otherwise time-consuming design/redesign loop.<>