Magnetic Anisotropy Enhancement for hcp Structured Co Alloy Thin Films through Pt Doping

Author

Shen, W. ; Das, A. ; Racine, M. ; Cheng, R. ; Judy, J.H. ; Wang, J.

Author_Institution

Minnesota Univ., Minneapolis

fYear

2006

fDate

8-12 May 2006

Firstpage

171

Lastpage

171

Abstract

This study aims to investigate the Pt doping effects in Ru interlayer to adjust Ru lattice. A DC magnetron sputtering system is used to deposit the films. XRD and TEM are used to evaluate the film orientation and microstructure. Magnetic properties such as perpendicular hysteresis loops and coercivity are tested using a vibrating sample magnetometer. Results show that the highest value for CoCrPt-SiO₂ film happens at around 24-28% Pt content, with magnetic anisotropy field of 16.0 kOe.

Keywords

X-ray diffraction; chromium alloys; cobalt alloys; coercive force; magnetic anisotropy; magnetic hysteresis; magnetic thin films; platinum alloys; silicon compounds; sputter deposition; transmission electron microscopy; CoCrPt-SiO₂; DC magnetron sputtering; TEM; XRD; coercivity; doping effects; film orientation; hcp structured Co alloy thin films; magnetic anisotropy; microstructure; perpendicular hysteresis loops; vibrating sample magnetometer; Cobalt alloys; Doping; Lattices; Magnetic anisotropy; Magnetic films; Microstructure; Perpendicular magnetic anisotropy; Platinum alloys; Sputtering; X-ray scattering;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 2006. INTERMAG 2006. IEEE International

Conference_Location

San Diego, CA

Print_ISBN

1-4244-1479-2

Type

conf

DOI

10.1109/INTMAG.2006.375671

Filename

4261605