A Novel Magnetic Micro Deflector of Electron Beam Control for Electron Beam Microcolumn Systems

Author

Rong, R. ; Kim, H. ; Park, S. ; Hwang, N. ; Kim, B. ; Ahn, C.

Author_Institution

Cincinnati Univ., Cincinnati

fYear

2006

fDate

8-12 May 2006

Firstpage

586

Lastpage

586

Abstract

A prototype micromachined magnetic deflector for controlling electron beam deflection in an electron beam microcolumn system (EBMS) is developed and tested. This assembled unit has major components which are electron emission emitter, source lens (extractor, accelerator, and limiting aperture), electrostatic deflector, Einzel lens, and an additional magnetic deflector. It is noticed that the deflection of the electron beam linearly increased with the applied driving current up to 70 mum. The magnetic deflector showed good performance in controlling the electron beam deflection.

Keywords

beam handling equipment; electron beam applications; electrostatic devices; magnetic devices; micromechanical devices; Einzel lens; applied driving current; electron beam control; electron beam microcolumn systems; electron emission emitter; electrostatic deflector; limiting aperture; magnetic microdeflector; source lens; Accelerator magnets; Assembly; Control systems; Electron accelerators; Electron beams; Electron emission; Lenses; Micromagnetics; Prototypes; System testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 2006. INTERMAG 2006. IEEE International

Conference_Location

San Diego, CA

Print_ISBN

1-4244-1479-2

Type

conf

DOI

10.1109/INTMAG.2006.376310

Filename

4262019