DocumentCode
2944639
Title
Effect of Deposition Rate on Microstructure of CoCrPt-SiO2 Granular Longitudinal Media for Tape Applications
Author
Wang, L. ; Lee, H. ; Qin, Y. ; Bain, J.A. ; Laughlin, D.E.
Author_Institution
Carnegie Mellon Univ., Pittsburgh
fYear
2006
fDate
8-12 May 2006
Firstpage
634
Lastpage
634
Abstract
This work focuses on the effect of deposition rate in the longitudinal version of this materials system. Since two phase segregation must occur during the sputter deposition process, it is anticipated that deposition rate may be a crucial deposition parameter, and that high deposit rates may not allow this segregation to proceed to completion in each layer of the depositing film before being buried by subsequent layers.
Keywords
chromium alloys; cobalt alloys; crystal microstructure; platinum alloys; segregation; silicon compounds; sputter deposition; CoCrPt-SiO2; deposition rate effect; granular longitudinal media; microstructure; phase segregation; sputter deposition; tape applications; Application software; Grain size; Magnetic films; Magnetic separation; Materials science and technology; Microstructure; Perpendicular magnetic recording; Sputtering; Substrates; Time measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2006. INTERMAG 2006. IEEE International
Conference_Location
San Diego, CA
Print_ISBN
1-4244-1479-2
Type
conf
DOI
10.1109/INTMAG.2006.376358
Filename
4262067
Link To Document