DocumentCode
2964209
Title
Moving Away from Silicon: The Role of Interconnect in New Memory Technologies
Author
Wouters, Dirk J.
Author_Institution
IMEC, Leuven
fYear
2007
fDate
4-6 June 2007
Firstpage
169
Lastpage
171
Abstract
New non-volatile memory concepts are based on non-Si materials, enabling new cell integration schemes. Memory elements are integrated in-between the first interconnect layers for realizing smaller cell sizes. New rectifying materials allow full decoupling from the substrate and 3-D stacking of cross-point memory arrays, moving more functionality into the back-end, and changing the role of interconnect from a passive to an active network. 3-D stacking is also pursued for Si-based memories using multiple active Si layers, with new contact technology challenges.
Keywords
active networks; integrated circuit interconnections; passive networks; 3D stacking; cell integration schemes; cross-point memory arrays; interconnect layers; memory technologies; passive-active network; Ferroelectric materials; Inorganic materials; MOSFET circuits; Nonvolatile memory; Organic materials; Phase change random access memory; Resistors; Silicon; Stacking; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
International Interconnect Technology Conference, IEEE 2007
Conference_Location
Burlingame, CA
Print_ISBN
1-4244-1069-X
Electronic_ISBN
1-4244-1070-3
Type
conf
DOI
10.1109/IITC.2007.382380
Filename
4263692
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