DocumentCode
2965868
Title
Improvement of thick InGaN template by thin InGaN buffer grown at low temperature
Author
Zhao, Wei ; Wang, Lai ; Xi, Guangyi ; Li, Hongtao ; Jiang, Yang ; Han, Yanjun ; Luo, Yi
Author_Institution
Dept. of Electron. Eng., Tsinghua Univ., Beijing
fYear
2008
fDate
2-15 Aug. 2008
Firstpage
183
Lastpage
184
Abstract
Thick InGaN templates with an without InGaN buffer were grown using MOCVD method. It is demonstrated that the crystal quality of the InGaN template can be efficiently improved by the InGaN buffer layer.
Keywords
III-V semiconductors; MOCVD coatings; gallium compounds; indium compounds; semiconductor growth; wide band gap semiconductors; InGaN; MOCVD method; crystal quality; low temperature growth; thick template; thin buffer; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano-Optoelectronics Workshop, 2008. i-NOW 2008. International
Conference_Location
Shonan Village
Print_ISBN
978-1-4244-2656-0
Type
conf
DOI
10.1109/INOW.2008.4634501
Filename
4634501
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