Effect of deposition temperature to electrical, structural and optical properties of amorphous carbon thin film prepared by TCVD

Author

Mohamad, Fakardellawarni ; Noor, Uzer Mohd ; Rusop, Mohamad

Author_Institution

Fac. of Electr. Eng., Univ. Teknol. MARA (UiTM), Shah Alam, Malaysia

fYear

2012

fDate

24-27 June 2012

Firstpage

705

Lastpage

709

Abstract

Amorphous carbon (a-C) thin films have been prepared by thermal chemical vapor deposition (TCVD) technique at different temperature. The preparation involved argon (Ar), and camphor as carrier gas and carbon source respectively. The effects of deposition temperature in the a-C thin film on electrical, structural and optical properties was characterized by using Advantest R6243 DC Voltage Current Source/Monitor and SemiPro Curve Software, Scanning Electron Microscopy (SEM) and UV-VIS-NIR spectroscopy. The current-voltage (I-V) measurement studies demonstrate that the conductivity increased along the deposition temperature. There are also significant changes in structural and optical band gap as deposition temperature varies.

Keywords

carbon; chemical vapour deposition; electrical conductivity; energy gap; infrared spectra; optical constants; scanning electron microscopy; ultraviolet spectra; visible spectra; Advantest R6243 DC Voltage Current Source/Monitor; C; SemiPro Curve Software; UV-VIS-NIR spectroscopy; amorphous carbon thin film; conductivity; current-voltage measurement; deposition temperature; optical band gap; scanning electron microscopy; thermal chemical vapor deposition; Carbon; Conductivity; Diamond-like carbon; Optical films; Temperature; Amorphous carbon; Camphor; TCVD; Thin films;

fLanguage

English

Publisher

ieee

Conference_Titel

Humanities, Science and Engineering Research (SHUSER), 2012 IEEE Symposium on

Conference_Location

Kuala Lumpur

Print_ISBN

978-1-4673-1311-7

Type

conf

DOI

10.1109/SHUSER.2012.6268906

Filename

6268906