• DocumentCode
    2978240
  • Title

    An Optoelectronic Switch with Multiple Operation States

  • Author

    Guo, Der-Feng ; Tsai, Jung-Hui ; Weng, Tzu-Yen

  • Author_Institution
    Air Force Acad., Kaohsiung
  • fYear
    2007
  • fDate
    14-18 May 2007
  • Firstpage
    252
  • Lastpage
    255
  • Abstract
    A Schottky-contact triangular-barrier optoelectronic switch (STOS), grown by molecular beam epitaxy (MBE), has been fabricated. The triangular barrier, formed by inserting an InGaAs delta-doped (delta-doped) quantum well into an n--GaAs layer, provides a potential well for hole accumulation. Due to the hole accumulation in the delta-doped well and the sequential avalanche multiplications in the reverse-biased pn and metal-semiconductor (M-S) junctions, a double S-shaped negative-differential-resistance (NDR) phenomenon is observed in the current-voltage (I-V) characteristics. The STOS shows a flexible optical function related to the triangular barrier height controllable by incident light. The multistate is switchable by both optical and electrical inputs.
  • Keywords
    Schottky barriers; avalanche breakdown; electro-optical switches; molecular beam epitaxial growth; optoelectronic devices; p-n junctions; quantum wells; semiconductor-metal boundaries; InGaAs delta-doped quantum well; MBE growth; STOS; Schottky-contact triangular-barrier optoelectronic switch; current-voltage characteristics; double S-shaped negative-differential-resistance phenomenon; hole accumulation; metal-semiconductor junction; molecular beam epitaxy; multiple operation states; n--GaAs layer; reverse-biased pn junction; sequential avalanche multiplication; Communication switching; Indium gallium arsenide; Indium phosphide; Molecular beam epitaxial growth; Optical bistability; Optical switches; Potential well; Stimulated emission; Substrates; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
  • Conference_Location
    Matsue
  • ISSN
    1092-8669
  • Print_ISBN
    1-4244-0875-X
  • Electronic_ISBN
    1092-8669
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2007.381171
  • Filename
    4265928