• DocumentCode
    3007627
  • Title

    Simulation and Experimental Results of a 0.15µm Independent Double Gated CMOS Transistor

  • Author

    Vasireddy, V. ; Parke, S.

  • Author_Institution
    Tennessee Tech Univ., Cookeville, TN, USA
  • fYear
    2010
  • fDate
    June 28 2010-July 1 2010
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    Independent double gated transistors give better control of the channel and dynamic tradeoff between power and performance. An independent double gated (IDG) FlexFET transistor is simulated using the Silvaco Atlas tool and the results are then compared with the data obtained from experimental devices manufactured by American Semiconductor Inc. (ASI). A reasonable correlation between the simulations and the experimental devices is obtained, following careful calibration of the simulation parameters. The bottom gate control factor (f) (i.e. the ratio of the change in threshold voltage to the change in bottom gate voltage) is observed to be around 0.3. The simulator is calibrated to match the experimental results by changing several parameters.
  • Keywords
    CMOS integrated circuits; MOSFET; calibration; semiconductor device models; Silvaco Atlas tool; bottom gate control factor; independent double gated CMOS transistor; independent double gated FlexFET transistor; simulator calibration; size 0.15 mum; Calibration; Energy consumption; MOS devices; MOSFET circuits; Semiconductor device manufacture; Silicon; Threshold voltage; Transistors; Virtual manufacturing; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro/Nano Symposium (UGIM), 2010 18th Biennial University/Government/Industry
  • Conference_Location
    West Lafayette, IN
  • ISSN
    0749-6877
  • Print_ISBN
    978-1-4244-4731-2
  • Electronic_ISBN
    0749-6877
  • Type

    conf

  • DOI
    10.1109/UGIM.2010.5508928
  • Filename
    5508928