• DocumentCode
    3024509
  • Title

    Pure-shear mode BAW resonator consisting of (112̄0) textured AlN films

  • Author

    Yanagitani, Takahiko ; Kiuch, Masato

  • Author_Institution
    Grad. Sch. of Eng., Nagoya Inst. of Technol., Nagoya
  • fYear
    2008
  • fDate
    2-5 Nov. 2008
  • Firstpage
    90
  • Lastpage
    93
  • Abstract
    In-plane and out-of-plane oriented (11 2macr 0) textured AlN thin films are attractive for shear mode piezoelectric devices and sensors, such as FBAR and SH-SAW devices. It is proposed here that highly oriented (11 2macr0) AlN thin films can be fabricated using ion beam sputter-deposition system with grazing incidence to the substrate surface. Full-width-at-half-maximum (FWHM) values of the omega-scan rocking curve and phi-scan profile curves of the (11 2macr2) X-ray diffraction poles were measured to be 4.6deg and 23deg, respectively. Shear-mode high-overtone acoustic resonator (HBAR) with (11 2macr0) textured AlN film excited pure-shear wave without any longitudinal wave excitation. New device structure is expected because this film can be deposited on various substrates and curved surfaces.
  • Keywords
    III-V semiconductors; X-ray diffraction; acoustic resonators; aluminium compounds; bulk acoustic wave devices; piezoelectric devices; semiconductor thin films; sputtered coatings; thin film devices; wide band gap semiconductors; AlN; FWHM; X-ray diffraction pole; full-width-at-half-maximum value; grazing incidence; ion beam sputter-deposition system; omega-scan rocking curve; phi-scan profile curve; pure-shear mode BAW resonator; shear mode piezoelectric device; shear-mode high-overtone acoustic resonator; textured thin film; Film bulk acoustic resonators; Ion beams; Piezoelectric devices; Piezoelectric films; Sputtering; Substrates; Surface acoustic wave devices; Thin film devices; Thin film sensors; X-ray diffraction; (11 2̄ 0)AlN film; In-plane and out-of-plane orientation; Ion beam sputter-deposition; Shear wave excitation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium, 2008. IUS 2008. IEEE
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-2428-3
  • Electronic_ISBN
    978-1-4244-2480-1
  • Type

    conf

  • DOI
    10.1109/ULTSYM.2008.0022
  • Filename
    4803528