DocumentCode
3026050
Title
MOMBE growth of semi-insulating GaInAsP(λg=1.05 μm):Fe optical waveguides for integrated photonic devices
Author
Künzel, H. ; Albrecht, P. ; Ebert, S. ; Gibis, R. ; Harde, P. ; Kaiser, R. ; Kizuki, H. ; Malchow, S.
Author_Institution
Heinrich-Hertz-Inst. fur Nachrichtentech. Berlin GmbH, Germany
fYear
1997
fDate
11-15 May 1997
Firstpage
432
Lastpage
435
Abstract
Iron doping using elemental source material evaporated from a conventional effusion cell was applied during MOMBE growth of semi-insulating InP and GaInAsP(λ=1.05 μm) for waveguide applications. The influence of the growth temperature and the doping concentration on the electrical and optical properties was investigated in the range from 455°C to 505°C and 5·1015 cm -3 to 5·1015 cm-3, respectively. High optical quality is demonstrated by the appearance of excitonic emission in iron doped layers at 10 K. Resistivities in excess of 109 Ωcm were obtained for both materials at medium doping levels grown at the lower end of the investigated growth temperature range. In addition, SIMS measurements revealed homogeneous incorporation behaviour of the iron dopant in these materials. A tendency towards some accumulation/segregation of the iron dopant was observed at higher doping levels and growth temperatures resulting in some decrease of the resistivity. GaInAsP/InP waveguide structures grown at 485°C (which is the minimum temperature necessary for selective deposition) showed resistivities of 5·107Ω·cm7 in combination with low optical losses of 2.5±0.5 dB/cm
Keywords
III-V semiconductors; chemical beam epitaxial growth; doping profiles; electrical resistivity; gallium arsenide; indium compounds; integrated optics; iron; optical fabrication; optical losses; optical waveguides; photoluminescence; secondary ion mass spectra; semiconductor doping; semiconductor growth; 1.05 mum; 10 K; 1E9 ohmcm; 455 to 505 C; 5E7 ohmcm; Fe doping; GaInAsP/InP waveguide structures; GaInAsP:Fe optical waveguides; GaInAsP:Fe-InP; InP:Fe; MOMBE growth; SIMS measurements; doping concentration; effusion cell; electrical properties; excitonic emission; growth temperature; high optical quality; homogeneous incorporation behaviour; integrated photonic devices; low optical losses; optical properties; resistivities; selective deposition; semi-insulating GaInAsP; Conductivity; Doping; Indium phosphide; Integrated optics; Iron; Molecular beam epitaxial growth; Optical materials; Optical pumping; Optical waveguides; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 1997., International Conference on
Conference_Location
Cape Cod, MA
ISSN
1092-8669
Print_ISBN
0-7803-3898-7
Type
conf
DOI
10.1109/ICIPRM.1997.600186
Filename
600186
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