• DocumentCode
    3026249
  • Title

    Development and application of in-house high voltage power supply for atmospheric pressure plasma treatment system

  • Author

    Nayan, Nafarizal ; Zahariman, M.R. ; Ahmad, M.F.B. ; Ali, R.A.M. ; Sahdan, Mohd Zainizan ; Hashim, U.

  • Author_Institution
    Microelectron. & Nanoelectronic - Shamsuddin Res. Centre (MiNT-SRC), Univ. Tun Hussein Onn Malaysia, Parit Raja, Malaysia
  • fYear
    2012
  • fDate
    19-21 Sept. 2012
  • Firstpage
    596
  • Lastpage
    599
  • Abstract
    Atmospheric pressure plasma is now being widely developed for simple surface treatment process and for fast medical tools sterilization. Plasma surface modification involves the interaction of the plasma generated excited species with a solid interface or coatings. The previous vacuum plasma system is not applicable and very costly. In the present project, we have developed the high voltage power supply and atmospheric pressure plasma using dielectric barrier discharge concept. The high voltage power supply was developed using a simple 555 timer and car´s ignition coil. Then, we investigate the plasma surface modification effect from the contact angle measurement and evaluate the roughness using surface profiler. We found that the contact angle decreased with the exposure time and surface roughness changed when exposed with atmospheric pressure plasma. It has been understood that a film coating will be create on glass and silicon surface when expose with atmospheric pressure plasma system in water vapor environment.
  • Keywords
    angular measurement; atmospheric pressure; contact angle; plasma applications; 555 timer; atmospheric pressure plasma treatment system; car ignition coil; contact angle measurement; dielectric barrier discharge concept; fast medical tools sterilization; film coating; glass surface; in-house high voltage power supply; plasma surface modification effect; silicon surface; solid coatings; solid interface; surface profiler; surface roughness; surface treatment process; time roughness; water vapor environment; Glass; Plasmas; Rough surfaces; Substrates; Surface discharges; Surface roughness; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Electronics (ICSE), 2012 10th IEEE International Conference on
  • Conference_Location
    Kuala Lumpur
  • Print_ISBN
    978-1-4673-2395-6
  • Electronic_ISBN
    978-1-4673-2394-9
  • Type

    conf

  • DOI
    10.1109/SMElec.2012.6417216
  • Filename
    6417216