• DocumentCode
    3030458
  • Title

    Power switch optimization and sizing in 65nm PD-SOI considering supply voltage noise

  • Author

    Le Coz, J. ; Valentian, A. ; Flatresse, P. ; Belleville, M.

  • Author_Institution
    STMicroelectronics, Crolles, France
  • fYear
    2010
  • fDate
    2-4 June 2010
  • Firstpage
    186
  • Lastpage
    189
  • Abstract
    In this paper, several power gating solutions are analysed in 65 nm PDSOI technology, taking into account the implementation area. A new figure of merit has been proposed to easily determine the best tradeoff between leakage, drive current and area. It shows that the best solution is to use a Body-Contacted transistor with a non-minimal gate length, enabling leakage currents of the same order of magnitude than in Bulk. A second analysis on specific PD-SOI Logic CORE electrical behaviour has been performed. This analysis allows determining the power switch network sizing implementation taking into account decoupling capacitance, ON Logic CORE current and equivalent parasitic supply inductance.
  • Keywords
    leakage currents; silicon-on-insulator; switches; switching circuits; transistors; PD-SOI logic core electrical behaviour; body-contacted transistor; decoupling capacitance; equivalent parasitic supply inductance; figure of merit; leakage currents; nonminimal gate length; power gating solutions; power switch network sizing; power switch optimization; size 65 nm; supply voltage noise; Circuits; Inductance; Leakage current; Logic; MOSFETs; Parasitic capacitance; Power dissipation; Silicon on insulator technology; Switches; Voltage; 65nm PD-SOI; Decoupling Capacitance; MTCMOS; Parasitic Inductance; Power Switch;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    IC Design and Technology (ICICDT), 2010 IEEE International Conference on
  • Conference_Location
    Grenoble
  • Print_ISBN
    978-1-4244-5773-1
  • Type

    conf

  • DOI
    10.1109/ICICDT.2010.5510263
  • Filename
    5510263