DocumentCode
3030458
Title
Power switch optimization and sizing in 65nm PD-SOI considering supply voltage noise
Author
Le Coz, J. ; Valentian, A. ; Flatresse, P. ; Belleville, M.
Author_Institution
STMicroelectronics, Crolles, France
fYear
2010
fDate
2-4 June 2010
Firstpage
186
Lastpage
189
Abstract
In this paper, several power gating solutions are analysed in 65 nm PDSOI technology, taking into account the implementation area. A new figure of merit has been proposed to easily determine the best tradeoff between leakage, drive current and area. It shows that the best solution is to use a Body-Contacted transistor with a non-minimal gate length, enabling leakage currents of the same order of magnitude than in Bulk. A second analysis on specific PD-SOI Logic CORE electrical behaviour has been performed. This analysis allows determining the power switch network sizing implementation taking into account decoupling capacitance, ON Logic CORE current and equivalent parasitic supply inductance.
Keywords
leakage currents; silicon-on-insulator; switches; switching circuits; transistors; PD-SOI logic core electrical behaviour; body-contacted transistor; decoupling capacitance; equivalent parasitic supply inductance; figure of merit; leakage currents; nonminimal gate length; power gating solutions; power switch network sizing; power switch optimization; size 65 nm; supply voltage noise; Circuits; Inductance; Leakage current; Logic; MOSFETs; Parasitic capacitance; Power dissipation; Silicon on insulator technology; Switches; Voltage; 65nm PD-SOI; Decoupling Capacitance; MTCMOS; Parasitic Inductance; Power Switch;
fLanguage
English
Publisher
ieee
Conference_Titel
IC Design and Technology (ICICDT), 2010 IEEE International Conference on
Conference_Location
Grenoble
Print_ISBN
978-1-4244-5773-1
Type
conf
DOI
10.1109/ICICDT.2010.5510263
Filename
5510263
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