DocumentCode
3031344
Title
Lead-free flip chip solution for 40 nm extreme low-k interconnect system
Author
Hou, S.Y. ; Shih, C.W. ; Wu, W.C. ; Hsieh, C.H. ; Su, A.J. ; Tung, C.H. ; Jeng, S.P. ; Li, M.J. ; Yu, Doug C H
Author_Institution
Integrated Interconnect & Packaging Div., Semicond. Manuf. Co., Ltd. (TSMC), Hsinchu, Taiwan
fYear
2010
fDate
6-9 June 2010
Firstpage
1
Lastpage
3
Abstract
Lead-free flip chip package production solution for 40 nm technology node with aggressive ELK interconnect scheme and tight bump pitch of 150 μm is demonstrated. The use of LF bump and ELK dielectric in a same electronic component poses severe technical challenges due to the pronounced chip-packaging interaction in the system. In this paper, we reviewed the fundamental treatments to enhance the LF bump reliability. New challenges associated with the introduction of ELK are discussed. A careful optimization of material and layer thickness for each constituent in the flip chip package is the key to mitigate the chip-package interactions and to enable LF in 40 nm ELK interconnect.
Keywords
electronics packaging; flip-chip devices; integrated circuit interconnections; LF bump reliability; aggressive ELK interconnect; chip-packaging interaction; extreme low-k interconnect system; lead-free flip chip package production; lead-free flip chip solution; size 40 nm; CMOS technology; Electronics packaging; Environmentally friendly manufacturing techniques; Flip chip; Foundries; Lead; Research and development; Semiconductor device manufacture; Semiconductor device packaging; Thermal stresses;
fLanguage
English
Publisher
ieee
Conference_Titel
Interconnect Technology Conference (IITC), 2010 International
Conference_Location
Burlingame, CA
Print_ISBN
978-1-4244-7676-3
Type
conf
DOI
10.1109/IITC.2010.5510307
Filename
5510307
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