DocumentCode
3037765
Title
Electrical and optical properties of RF sputtered zinc oxide films
Author
Arora, A.K. ; Srivastava, Rama ; Mansingh, Abhai
Author_Institution
Dept. of Phys. & Astrophys., Delhi Univ., India
fYear
1990
fDate
6-8 Jun 1990
Firstpage
710
Lastpage
712
Abstract
Zinc oxide films were deposited by RF sputtering using an oxide target with a room-temperature substrate. Dry air and argon were used as ambients. The target-to-substrate (T-S) distance was varied between 3 cm and 7 cm. The as-grown films were highly resistive and there was no marked difference in the electrical, optical, and structural properties for the films grown at different (T-S) distances and in different ambients
Keywords
electronic conduction in insulating thin films; insulating thin films; sputtered coatings; zinc compounds; 3 to 7 cm; Ar; RF sputtering; ZnO; ambients; as-grown films; dry air; electrical properties; films; optical properties; oxide target; resistive films; room-temperature substrate; structural properties; target to substrate distance; Argon; Conductive films; Dielectric substrates; Optical films; Optical surface waves; Radio frequency; Rough surfaces; Sputtering; Surface roughness; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics, 1990., IEEE 7th International Symposium on
Conference_Location
Urbana-Champaign, IL
Print_ISBN
0-7803-0190-0
Type
conf
DOI
10.1109/ISAF.1990.200354
Filename
200354
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