DocumentCode
3037784
Title
Using TMR Architectures for Yield Improvement
Author
Vial, J. ; Bosio, A. ; Girard, P. ; Landrault, C. ; Pravossoudovitch, S. ; Virazel, A.
Author_Institution
Lab. d´´Inf., Univ. Montpellier II, Montpellier
fYear
2008
fDate
1-3 Oct. 2008
Firstpage
7
Lastpage
15
Abstract
With the technology entering the nano dimension, manufacturing processes are less and less reliable, thus drastically impacting the yield. A possible solution to alleviate this problem in the future could consist in using fault tolerant architectures to tolerate manufacturing defects. In this paper, we use the classical triple modular redundancy (TMR) fault tolerant architecture as a case study. Firstly we analyze the conditions that make the use of TMR architectures interesting for yield improvement purpose. In the second part of the paper, we investigate the test requirements for the TMR architecture and we propose a solution for generating test patterns for this type of architecture. Finally, we propose a new manner to implement the TMR architecture that makes it very effective for yield improvement purpose. Experimental results are provided on ISCAS and ITC benchmark circuits to prove the efficiency of the proposed approach in terms of yield improvement with a low area overhead.
Keywords
VLSI; benchmark testing; fault tolerance; integrated circuit manufacture; ITC benchmark circuits; TMR architectures; VLSI systems; fault tolerant architectures; manufacturing processes; tolerate manufacturing defect; triple modular redundancy; Benchmark testing; Circuit faults; Circuit testing; Fault tolerance; Fault tolerant systems; Integrated circuit yield; Manufacturing processes; Redundancy; Test pattern generators; Very large scale integration; Fault-tolerance; TMR; manufacturing defects; test of tolerant architecture; yield ramp-up;
fLanguage
English
Publisher
ieee
Conference_Titel
Defect and Fault Tolerance of VLSI Systems, 2008. DFTVS '08. IEEE International Symposium on
Conference_Location
Boston, MA
ISSN
1550-5774
Print_ISBN
978-0-7695-3365-0
Type
conf
DOI
10.1109/DFT.2008.23
Filename
4641152
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