Design and implementation of an adaptive controller for electron beam evaporation system

Author

Ahadi, Majid ; Jamshidi, Kambiz ; Rashidian, Bizhan

Author_Institution

Sharif Univ. of Technol., Tehran, Iran

fYear

2000

fDate

2000

Firstpage

349

Lastpage

352

Abstract

In this paper, design and implementation of a high accuracy alloy evaporation system is reported. The thermodynamics, modeling, identification and controller designs of the system are discussed. All the necessary hardware and software have been made and tested. The performance and accuracy of the system have been verified using RBS (Rutherford backscattering) and PIXE (particle induced X-ray emission) (Sze, 1989) of deposited films (Ahadi and Rashidian, 1999). There is no theoretical limitation for the number of elements in the alloy in the method presented here; however, the system reported here has been implemented for use of up to 6 different materials for formation of the desired alloy

Keywords

Rutherford backscattering; X-ray chemical analysis; adaptive control; controllers; electron beam deposition; integrated circuit metallisation; ion microprobe analysis; process control; semiconductor device metallisation; semiconductor process modelling; PIXE; RBS; Rutherford backscattering; adaptive controller; adaptive controller design; adaptive controller implementation; alloy evaporation system; controller design; deposited films; electron beam evaporation system; identification; modeling; multi-element alloy evaporation; particle induced X-ray emission; system accuracy; system performance; thermodynamics; Adaptive control; Control system synthesis; Control systems; Electron beams; Microelectronics; Programmable control; Real time systems; Sputtering; Thermodynamics; Thin film sensors;

fLanguage

English

Publisher

ieee

Conference_Titel

Microelectronics, 2000. ICM 2000. Proceedings of the 12th International Conference on

Conference_Location

Tehran

Print_ISBN

964-360-057-2

Type

conf

DOI

10.1109/ICM.2000.916475

Filename

916475