• DocumentCode
    304408
  • Title

    Factors and intermediates governing by product distribution for plasma chemical processing

  • Author

    Futamura, Shigeru ; Zhang, Aihua ; Prieto, Graciela ; Yamamoto, Toshiaki

  • Author_Institution
    Nat. Inst. for Resources & Environ., Ibaraki, Japan
  • Volume
    3
  • fYear
    1996
  • fDate
    6-10 Oct 1996
  • Firstpage
    1818
  • Abstract
    Plasma chemical decomposition of butane was investigated with a ferroelectric packed-bed plasma reactor to obtain information on the fundamental chemical processes occurring in nonthermal plasma. It has been shown that butane decomposition efficiencies were higher in nitrogen rather than in air. This fact suggests that energy transfer from hot electrons to butane is mainly responsible for the initial decomposition of butane. Nitrogen incorporation was observed for acetonitrile only in dry air and for nitromethane in air. Barium titanate and water have been shown to act as monooxygen transfer agents in nitrogen. Lattice oxygen atoms in barium titanate can be consumed in the formation of N2O and CO, depending on reaction conditions. Water is much more reactive than barium titanate as an oxidant in nonthermal plasma, and it can oxygenate butane to butanols, epoxidize 1- and 2-butenes, and oxidize CO to CO2. Water, which has a dichotomic nature regarding oxygenation/hydrogenation in plasma, can act as a hydrogen source toward alkyl radicals formed in the initial decomposition of butane. In air, triplet oxygen molecules are the most reactive oxygen source in the presence or absence of water, and carbon balance can be improved with suppression of by products due to promoted autoxidation processes
  • Keywords
    organic compounds; plasma applications; waste disposal; butane decomposition; ferroelectric packed-bed plasma reactor; fundamental chemical processes; hydrogenation; nonthermal plasma; oxygenation; plasma chemical processing; product distribution; promoted autoxidation processes; waste treatment; Barium; Chemical processes; Chemical reactors; Ferroelectric materials; Inductors; Nitrogen; Plasma chemistry; Plasma sources; Titanium compounds; Water resources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Industry Applications Conference, 1996. Thirty-First IAS Annual Meeting, IAS '96., Conference Record of the 1996 IEEE
  • Conference_Location
    San Diego, CA
  • ISSN
    0197-2618
  • Print_ISBN
    0-7803-3544-9
  • Type

    conf

  • DOI
    10.1109/IAS.1996.559315
  • Filename
    559315