Feasibility study of immersion system using high-index materials

Author

Sakai, K. ; Iwasaki, Y. ; Mori, S. ; Yamada, A. ; Yamashita, K. ; Nishikawara, T.

Author_Institution

Canon Inc., Tochigi

fYear

2007

fDate

5-8 Nov. 2007

Firstpage

10

Lastpage

11

Abstract

In this paper, we discuss the feasibility of ArF immersion system using high-index materials. For the next generation of lithography, we focus on ArF immersion system using high-index materials. It is possible to increase the NA up to 1.45 using a high-index fluid (HIF) whose refractive index is about 1.65 as an immersion fluid. HIF materials have some advantages as higher transparency and lower evaporation heat compared with water. On the other hand, HIF immersion system has some issues that are not involved with water immersion system. The stability of HIF transparency easily degraded by dissolved oxygen or laser irradiation.

Keywords

argon compounds; birefringence; immersion lithography; laser beam effects; photolithography; refractive index; water; ArF; high-index materials; immersion lithography; immersion system; numerical aperture; refractive index; Apertures; Birefringence; Laboratories; Laser stability; Lenses; Lithography; Nanotechnology; Optical materials; Refractive index; Water heating;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology, 2007 Digest of papers

Conference_Location

Kyoto

Print_ISBN

978-4-9902472-4-9

Type

conf

DOI

10.1109/IMNC.2007.4456079

Filename

4456079