Effect of Fluorine Atom on Acid Generation in Chemically Amplifiled EUV Resist

Author

Yamamoto, Hiroki ; Kozawa, T. ; Tagawa, Seiichi ; Yukawa, Hiroto ; Sato, Mitsuru ; Onodera, Junichi

Author_Institution

Osaka Univ., Osaka

fYear

2007

fDate

5-8 Nov. 2007

Firstpage

76

Lastpage

77

Abstract

In this study, the effect of fluorine atoms on acid generation upon EUV exposure using an acid sensitive dye is investigated. Fluorinated polymers is used as polymers. Triphenylsulfonium-triflate (TPS-tf) is used as an acid generator. Coumarin6 (C6, Aldrich Chem.) is used as an indicator to evaluate acid yields. Tetrahydrofuran (THF, Wako) is used as a casting solvent. It is experimentally confirmed that the increase in the absorption coefficient of polymers leads to the increase in the acid yield.

Keywords

dyes; indicators; polymer films; polymers; resists; thin films; ultraviolet lithography; Coumarin6; absorption coefficient; acid generation; acid generator; acid sensitive dye; chemically amplified extreme ultraviolet resist; extreme ultraviolet lithography; film thickness; fluorinated polymers; fluorine atom effect; indicator; tetrahydrofuran; triphenylsulfonium-triflate; Absorption; Casting; Chemical industry; Electronic mail; Electrons; Lead; Lithography; Polymer films; Resists; Ultraviolet sources;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology, 2007 Digest of papers

Conference_Location

Kyoto

Print_ISBN

978-4-9902472-4-9

Type

conf

DOI

10.1109/IMNC.2007.4456112

Filename

4456112