DocumentCode
3049929
Title
Impact of mold geometries and imprinted resist thickness on velocity fields for nanoimprint lithography
Author
Lin, Chien-Hung ; Chen, Rongshun
Author_Institution
Nat. Tsing Hua Univ., Hsinchu
fYear
2007
fDate
5-8 Nov. 2007
Firstpage
318
Lastpage
319
Abstract
The effects of mold geometries and imprinted resist thickness on the polymer flow using numerical simulations during nanoimprint lithography is investigated. The velocity fields, including the lateral and vertical velocity, is studied to describe the mode of the polymer deformation, which is the key role to determine the mechanism of nanoimprint forming.
Keywords
deformation; nanolithography; polymers; imprinted resist thickness; mold geometries; nanoimprint forming; nanoimprint lithography; polymer deformation; polymer flow; Boundary conditions; Computational geometry; Costs; Fabrication; Mechanical engineering; Nanolithography; Polymers; Resists; Solid modeling; Weight control;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location
Kyoto
Print_ISBN
978-4-9902472-4-9
Type
conf
DOI
10.1109/IMNC.2007.4456232
Filename
4456232
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