Novel fabrication of micro-nano mixed 3D-structure by advanced hybrid nanoimprint lithography

To fabricate micro-nano mixed 3-D structures, the novel mold fabrication containing micro-nano patterns in both lateral and vertical directions is difficult because there are no suitable lithography methods having deep focus depth in nanopatterning. In the hybrid NIL approach, the nanostructure could be fabricated only on the top surface of microstructures. In this paper, a newly advanced hybrid patterning by thermal and UV NIL to fabricate micro-nano mixed structures is proposed not only on the top surface of the microstructure but also on the bottom of the microstructure without using deep dry etching or mixed and match lithography.