• DocumentCode
    3052460
  • Title

    Small angle scattering experiments on annealed gallium arsenide single crystal wafers

  • Author

    Herms, M. ; Goperigk, G. ; Klemm, V. ; Meier, G. ; Zychowitz, G.

  • Author_Institution
    Dept. of Electron. & Inf. Sci., Kyoto Inst. of Technol., Japan
  • fYear
    1998
  • fDate
    1998
  • Firstpage
    157
  • Lastpage
    160
  • Abstract
    The minimum concentration of excess atoms precipitated in GaAs and InP being necessary to cause observable small angle scattering of X-rays and neutrons (SAXS and SANS, respectively) was estimated. Consequently, undoped melt-grown GaAs wafers were annealed at high arsenic pressure. Areas of a strongly increased density of precipitate were localized by transmission electron microscopy. SAXS experiments have revealed a very weak intensity being dependent on energy at values of the scattering vector Q>0.02 Å-1. Different annealing procedures have resulted in distinguishable curves of SANS (Q<0.03 Å-1) in dependence on temperature and arsenic pressure
  • Keywords
    III-V semiconductors; X-ray scattering; annealing; gallium arsenide; neutron diffraction; precipitation; transmission electron microscopy; SANS; SAXS; SiC; annealed gallium arsenide single crystal wafers; annealing procedures; arsenic pressure; high arsenic pressure; precipitate; small angle X-ray scattering; small angle neutron scattering; small angle scattering experiments; transmission electron microscopy; undoped melt-grown GaAs wafers; Annealing; Crystals; Electromagnetic wave absorption; Electrons; Gallium arsenide; Neutrons; Particle scattering; Polymers; Storage area networks; X-ray scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconducting and Insulating Materials, 1998. (SIMC-X) Proceedings of the 10th Conference on
  • Conference_Location
    Berkeley, CA
  • Print_ISBN
    0-7803-4354-9
  • Type

    conf

  • DOI
    10.1109/SIM.1998.785098
  • Filename
    785098