DocumentCode
3052460
Title
Small angle scattering experiments on annealed gallium arsenide single crystal wafers
Author
Herms, M. ; Goperigk, G. ; Klemm, V. ; Meier, G. ; Zychowitz, G.
Author_Institution
Dept. of Electron. & Inf. Sci., Kyoto Inst. of Technol., Japan
fYear
1998
fDate
1998
Firstpage
157
Lastpage
160
Abstract
The minimum concentration of excess atoms precipitated in GaAs and InP being necessary to cause observable small angle scattering of X-rays and neutrons (SAXS and SANS, respectively) was estimated. Consequently, undoped melt-grown GaAs wafers were annealed at high arsenic pressure. Areas of a strongly increased density of precipitate were localized by transmission electron microscopy. SAXS experiments have revealed a very weak intensity being dependent on energy at values of the scattering vector Q>0.02 Å-1. Different annealing procedures have resulted in distinguishable curves of SANS (Q<0.03 Å-1) in dependence on temperature and arsenic pressure
Keywords
III-V semiconductors; X-ray scattering; annealing; gallium arsenide; neutron diffraction; precipitation; transmission electron microscopy; SANS; SAXS; SiC; annealed gallium arsenide single crystal wafers; annealing procedures; arsenic pressure; high arsenic pressure; precipitate; small angle X-ray scattering; small angle neutron scattering; small angle scattering experiments; transmission electron microscopy; undoped melt-grown GaAs wafers; Annealing; Crystals; Electromagnetic wave absorption; Electrons; Gallium arsenide; Neutrons; Particle scattering; Polymers; Storage area networks; X-ray scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconducting and Insulating Materials, 1998. (SIMC-X) Proceedings of the 10th Conference on
Conference_Location
Berkeley, CA
Print_ISBN
0-7803-4354-9
Type
conf
DOI
10.1109/SIM.1998.785098
Filename
785098
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