DocumentCode
3053130
Title
Full 3D string-level simulation of NAND flash device
Author
Kwon, U.-H. ; Nakamura, M. ; Ohkura, Y. ; Ishikawa, H. ; Ohji, Y.
Author_Institution
Semicond. Leading Edge Technol., Inc., Tsukuba
fYear
2008
fDate
9-11 Sept. 2008
Firstpage
37
Lastpage
40
Abstract
We present results of full 3D sting-level process and device simulation for a typical 60nm NAND flash device, whose read/program/erase characteristics are successfully simulated using the quasi-steady state simulation method. Self boosting and local-self boosting phenomena are also successfully simulated in string-level applying realistic pulse waves to the entire wordlines and string select line in a fully transient manner. The comparison between the simulation results and the experiments in various bias conditions shows the capability of our simulation methodology for the design optimization of NAND flash device in string level.
Keywords
NAND circuits; circuit simulation; flash memories; 3D string-level simulation; NAND flash device; self boosting phenomena; string select line; Boosting; Circuit simulation; Convergence; Design optimization; Doping; Electrodes; Mesh generation; Radiative recombination; Tunneling; Voltage; NAND flash device; TCAD; device simulation; local-self boosting; process simulation; self boosting;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices, 2008. SISPAD 2008. International Conference on
Conference_Location
Hakone
Print_ISBN
978-1-4244-1753-7
Type
conf
DOI
10.1109/SISPAD.2008.4648231
Filename
4648231
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