• DocumentCode
    3053130
  • Title

    Full 3D string-level simulation of NAND flash device

  • Author

    Kwon, U.-H. ; Nakamura, M. ; Ohkura, Y. ; Ishikawa, H. ; Ohji, Y.

  • Author_Institution
    Semicond. Leading Edge Technol., Inc., Tsukuba
  • fYear
    2008
  • fDate
    9-11 Sept. 2008
  • Firstpage
    37
  • Lastpage
    40
  • Abstract
    We present results of full 3D sting-level process and device simulation for a typical 60nm NAND flash device, whose read/program/erase characteristics are successfully simulated using the quasi-steady state simulation method. Self boosting and local-self boosting phenomena are also successfully simulated in string-level applying realistic pulse waves to the entire wordlines and string select line in a fully transient manner. The comparison between the simulation results and the experiments in various bias conditions shows the capability of our simulation methodology for the design optimization of NAND flash device in string level.
  • Keywords
    NAND circuits; circuit simulation; flash memories; 3D string-level simulation; NAND flash device; self boosting phenomena; string select line; Boosting; Circuit simulation; Convergence; Design optimization; Doping; Electrodes; Mesh generation; Radiative recombination; Tunneling; Voltage; NAND flash device; TCAD; device simulation; local-self boosting; process simulation; self boosting;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 2008. SISPAD 2008. International Conference on
  • Conference_Location
    Hakone
  • Print_ISBN
    978-1-4244-1753-7
  • Type

    conf

  • DOI
    10.1109/SISPAD.2008.4648231
  • Filename
    4648231