DocumentCode
3057323
Title
Tensile testing of thin-film materials on a silicon chip
Author
Yoshioka, Tetsuo ; Yamasaki, Masanori ; Shikida, Mitsuhiro ; Sato, Kazuo
Author_Institution
Dept. of Micro Syst. Eng., Nagoya Univ., Japan
fYear
1996
fDate
2-4 Oct 1996
Firstpage
111
Lastpage
117
Abstract
We describe a uniaxial tensile testing method which is performed on a single-crystal silicon chip, in order to evaluate the mechanical properties of thin films such as silicon and silicon compounds that have been formed on the chip. This method eliminates troublesome manipulation of small, fragile specimens as in previous tensile testing methods. The chip has been designed so that uniaxial tensile force is applied to a thin-film specimen when the lever structure on the same chip is loaded perpendicular to the chip surface. We developed a process to fabricate the chip using chemical anisotropic etching. We also developed a load and displacement measuring system and were able to measure fracture strain from 1%-1.8% for ⟨110⟩ single crystal silicon using this system
Keywords
elemental semiconductors; fracture; fracture toughness testing; mechanical strength; semiconductor technology; semiconductor thin films; silicon; tensile testing; Si chip; chemical anisotropic etching; chip surface; displacement measuring system; fracture strain; fragile specimens; lever structure; mechanical properties; micromechanical devices; single crystal; thin-film materials; thin-film specimen; uniaxial tensile testing; Displacement measurement; Materials testing; Mechanical factors; Performance evaluation; Semiconductor device measurement; Semiconductor thin films; Silicon compounds; Strain measurement; Surface cracks; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Machine and Human Science, 1996., Proceedings of the Seventh International Symposium
Conference_Location
Nagoya
Print_ISBN
0-7803-3596-1
Type
conf
DOI
10.1109/MHS.1996.563410
Filename
563410
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