DocumentCode
3063170
Title
Influence of “gate-biasing effect” on BSIT´s saturated property
Author
Yanfeng, Jiang ; Siyuan, Li ; Hairong, Li ; Xionghui, Meng
Author_Institution
Dept. of Phys., Lanzhou Univ., China
fYear
1998
fDate
1998
Firstpage
160
Lastpage
162
Abstract
For BSIT, it is well-known that the ideal relation between the drain current and the drain voltage with respect to the source is pentode-like, the saturated property. But the result from practical measurements shows ID increases slightly with rising VD , just like the phenomenon observed in a BJT, which is affected by “base width modulation”. The authors deduce that the main cause is “gate-biasing effect”. In this article, the effect is discussed in detail
Keywords
carrier density; semiconductor plasma; static induction transistors; BSIT; bipolar static induction transistor; drain current; drain voltage; gate-biasing effect; pentode-like relation; saturated property; Books; Boundary conditions; Current density; Electrons; Epitaxial layers; Equations; Physics; Plasma density; Plasma sources; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
Conference_Location
Beijing
Print_ISBN
0-7803-4306-9
Type
conf
DOI
10.1109/ICSICT.1998.785837
Filename
785837
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