• DocumentCode
    3064584
  • Title

    A new physical I-V model of deep-submicron FD SOI MOSFETs for analogue/digital circuit simulation

  • Author

    Xi, Xuemei ; Wang, Hongmei ; Zhang, Xing ; Wang, Yangyuan

  • Author_Institution
    Inst. of Microelectron., Beijing Univ., China
  • fYear
    1998
  • fDate
    1998
  • Firstpage
    435
  • Lastpage
    438
  • Abstract
    A new analytical current model in the strong inversion operation region for fully depleted SOI/MOSFET with channel lengths down to deep submicrometer range is developed with only one single expression for both linear and saturation region without using a smoothing function. The convergence when employed in circuit simulators is improved. Measurements on devices of varied geometry show good agreement with model predictions
  • Keywords
    MOSFET; circuit simulation; semiconductor device models; silicon-on-insulator; Si; analogue/digital circuit simulation; analytical current model; convergence improvement; deep-submicron SOI MOSFETs; fully depleted SOI MOSFET; physical I-V model; strong inversion operation region; Analytical models; Circuit simulation; Convergence; Digital circuits; Equations; MOSFETs; Microelectronics; Semiconductor device modeling; Smoothing methods; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    0-7803-4306-9
  • Type

    conf

  • DOI
    10.1109/ICSICT.1998.785915
  • Filename
    785915