• DocumentCode
    3066995
  • Title

    A compact dual-wavelength optical head for photo-lithography

  • Author

    Yuan-Chin Lee ; Shiuh Chao ; Chun-Chieh Huang ; Shuen-Chen Chen ; Chung-Ta Cheng

  • Author_Institution
    Electron. & Optoelectron. Res. Labs., Ind. Technol. Res. Inst., Hsinchu, Taiwan
  • fYear
    2013
  • fDate
    June 30 2013-July 4 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    A dual-wavelength optical head with an NA0.85 objective lens for lithography was developed. Both 405nm and 650nm are integrated in this optical head. It can be used to expose both organic and in-organic photo-resists and meanwhile performing focusing servo.
  • Keywords
    lenses; photoresists; NA0.85 objective lens; compact dual-wavelength optical head; focusing servo; inorganic photoresists; photolithography; wavelength 405 nm; wavelength 650 nm; Adaptive optics; Lenses; Optical design; Optical diffraction; Optical imaging; Optical sensors; Servomotors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2013 Conference on
  • Conference_Location
    Kyoto
  • Type

    conf

  • DOI
    10.1109/CLEOPR.2013.6600565
  • Filename
    6600565
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3066995