DocumentCode
3070816
Title
Characterisation of a Gasonics A1000 Microwave Photoresist Ashing System using the CHARM-2 Plasma Charging Monitor
Author
Cowley, Andrew
Author_Institution
National Semiconductor (UK) Ltd.
fYear
1996
fDate
13-14 May 1996
Firstpage
98
Lastpage
101
Keywords
CMOS process; Monitoring; Plasma density; Plasma devices; Plasma materials processing; Plasma measurements; Production systems; Qualifications; Resists; System testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN
0-9651577-0-9
Type
conf
DOI
10.1109/PPID.1996.715212
Filename
715212
Link To Document