DocumentCode
3073285
Title
Plasma Jet Etching at Atmospheric Pressure for Semiconductor Production
Author
Siniaguine, Oleg
Author_Institution
IPEC Precision, Inc.
fYear
1996
fDate
14-14 May 1996
Firstpage
151
Lastpage
153
Keywords
Argon; Atmospheric-pressure plasmas; Etching; MOS capacitors; Plasma applications; Plasma devices; Plasma materials processing; Plasma temperature; Production; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location
Santa Clara, CA, USA
Print_ISBN
0-9651577-0-9
Type
conf
DOI
10.1109/PPID.1996.715226
Filename
715226
Link To Document