• DocumentCode
    3075295
  • Title

    Polysilicon piezoresistive pressure sensor and its temperature compensation

  • Author

    Hongwei, Qu ; Suying, Yao ; Rong, Zhang ; Ganru, Mao ; Weixin, Zhang ; Xiaoqiang, Ma ; Lei, Ling

  • Author_Institution
    Dept. of Microelectron., Tianjin Univ., China
  • fYear
    1998
  • fDate
    1998
  • Firstpage
    914
  • Lastpage
    916
  • Abstract
    The polysilicon sensor is one of the most prospective pressure sensors because of its good performance at relatively high temperature. In this paper we put forward a technique to compensate its negative sensitivity temperature drift that prohibits its successful utilization in wide range of temperature. The technique is inexpensive and easy to practice in applications
  • Keywords
    elemental semiconductors; high-temperature electronics; piezoresistive devices; pressure sensors; silicon; Si; high temperature; negative sensitivity temperature drift; polysilicon piezoresistive pressure sensor; polysilicon sensor; temperature compensation; Bridge circuits; Doping; Ion implantation; Piezoresistance; Resistors; Sensor phenomena and characterization; Silicon; Stress; Temperature distribution; Temperature sensors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    0-7803-4306-9
  • Type

    conf

  • DOI
    10.1109/ICSICT.1998.786518
  • Filename
    786518