DocumentCode
3075517
Title
Charging Effects In Ion Implantation: Measurements and Models
Author
Current, Michael ; Vella, Michael C. ; Lukaszek, Wes
Author_Institution
Berkeley National Lab
fYear
1996
fDate
13-14 May 1996
Firstpage
202
Lastpage
205
Keywords
Current measurement; Ion beams; Ion implantation; Particle beams; Plasma density; Plasma immersion ion implantation; Plasma measurements; Plasma properties; Plasma sources; Semiconductor device modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN
0-9651577-0-9
Type
conf
DOI
10.1109/PPID.1996.715238
Filename
715238
Link To Document