Plasma-induced Oxide Contamination In a 0.35 μm CMOS Process

Author

Karnett, M. ; Zhou, J. ; Ghosh, Sudip ; Fritz, Leuterer ; Wu, Kaijie

Author_Institution

VLSI Technology, Inc

fYear

1996

fDate

13-14 May 1996

Firstpage

226

Lastpage

229

Keywords

CMOS process; Capacitors; Contamination; Electrons; MOS devices; Plasma confinement; Plasma devices; Process control; Strips; Threshold voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1996 1st International Symposium on

Print_ISBN

0-9651577-0-9

Type

DOI

10.1109/PPID.1996.715244

Filename

715244

Link To Document