• DocumentCode
    3076879
  • Title

    Effect of crystallisation on fatigue in sol-gel PZT ferroelectric capacitors with reactively sputtered RuO2 electrode layers

  • Author

    Norga, G.J. ; Wouters, D.J. ; Bartic, A. ; Fè, Laura ; Maes, H.E.

  • Author_Institution
    IMEC, Leuven, Belgium
  • fYear
    1998
  • fDate
    1998
  • Firstpage
    3
  • Lastpage
    6
  • Abstract
    Two new approaches for improving fatigue performance of sol-gel PZT based ferroelectric capacitors with RuO2 electrodes are discussed. First, minimizing the time delay between RuO2 sputtering and sol-gel PZT spinning increases the remanent polarisation of the crystallised PZT. Second, the use of thin (~5 nm) high-Ti PZT seed layer was found to be effective for improving fatigue performance. For an optimized seedlayer thickness, FECAPs with excellent fatigue characteristics (less than 10% decrease in Pr after 1011 cycles) were obtained
  • Keywords
    crystallisation; dielectric polarisation; fatigue; ferroelectric capacitors; ferroelectric materials; ferroelectric thin films; lead compounds; ruthenium compounds; sol-gel processing; sputtered coatings; thin film capacitors; PZT; PbZrO3TiO3; RuO2; crystallisation; fatigue; optimized seedlayer thickness; reactively sputtered RuO2 electrode layers; remanent polarisation; sol-gel PZT ferroelectric capacitors; time delay; Argon; Capacitors; Conducting materials; Crystallization; Electrodes; Fatigue; Ferroelectric materials; Nonvolatile memory; Polarization; Sputtering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics, 1998. ISAF 98. Proceedings of the Eleventh IEEE International Symposium on
  • Conference_Location
    Montreux
  • ISSN
    1099-4734
  • Print_ISBN
    0-7803-4959-8
  • Type

    conf

  • DOI
    10.1109/ISAF.1998.786622
  • Filename
    786622