DocumentCode
3076879
Title
Effect of crystallisation on fatigue in sol-gel PZT ferroelectric capacitors with reactively sputtered RuO2 electrode layers
Author
Norga, G.J. ; Wouters, D.J. ; Bartic, A. ; Fè, Laura ; Maes, H.E.
Author_Institution
IMEC, Leuven, Belgium
fYear
1998
fDate
1998
Firstpage
3
Lastpage
6
Abstract
Two new approaches for improving fatigue performance of sol-gel PZT based ferroelectric capacitors with RuO2 electrodes are discussed. First, minimizing the time delay between RuO2 sputtering and sol-gel PZT spinning increases the remanent polarisation of the crystallised PZT. Second, the use of thin (~5 nm) high-Ti PZT seed layer was found to be effective for improving fatigue performance. For an optimized seedlayer thickness, FECAPs with excellent fatigue characteristics (less than 10% decrease in Pr after 1011 cycles) were obtained
Keywords
crystallisation; dielectric polarisation; fatigue; ferroelectric capacitors; ferroelectric materials; ferroelectric thin films; lead compounds; ruthenium compounds; sol-gel processing; sputtered coatings; thin film capacitors; PZT; PbZrO3TiO3; RuO2; crystallisation; fatigue; optimized seedlayer thickness; reactively sputtered RuO2 electrode layers; remanent polarisation; sol-gel PZT ferroelectric capacitors; time delay; Argon; Capacitors; Conducting materials; Crystallization; Electrodes; Fatigue; Ferroelectric materials; Nonvolatile memory; Polarization; Sputtering;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics, 1998. ISAF 98. Proceedings of the Eleventh IEEE International Symposium on
Conference_Location
Montreux
ISSN
1099-4734
Print_ISBN
0-7803-4959-8
Type
conf
DOI
10.1109/ISAF.1998.786622
Filename
786622
Link To Document