DocumentCode
3086303
Title
Device linearity enhancement of InGaP/InGaAs/GaAs camel-gate p-channel pseudomorphic high electron mobility transistor
Author
Tsai, Jung-Hui ; Chiu, Shao-Yen ; Chu, Ying-Cheng ; Zhu, King-Poul
Author_Institution
Dept. of Phys., Kaohsiung Normal Univ., Taiwan
fYear
2004
fDate
15-16 March 2004
Firstpage
217
Lastpage
219
Abstract
A high-performance InGaP/InGaAs/GaAs p-channel pseudomorphic modulation-doped field effect transistor based on p+-GaAs/n+-InGaP/p-InGaP camel-like gate structure is demonstrated. Due to the p-n depletion of the camel-like gate and the presence of relatively large ΔEv at InGaP/InGaAs heterostructure, an extremely large gate turn-on voltage than 2 V is measured. For a 1×100 μm2 device, the experimental results show a maximum saturation current density of -345 mA/mm and a widely broad gate voltage swing than 4 V with 80 % maximum transconductance. Furthermore, the fT and fmax values are 3.1 and 4.8 GHz, respectively.
Keywords
III-V semiconductors; gallium arsenide; gallium compounds; high electron mobility transistors; indium compounds; 1 micron; 100 micron; 2 V; 3.1 GHz; 4 V; 4.8 GHz; InGaP-InGaAs-GaAs; InGaP/InGaAs/GaAs camel-gate p-channel pseudomorphic HEMT; device linearity enhancement; large gate turn-on voltage; maximum saturation current density; p-n depletion; Current density; Electron mobility; Gallium arsenide; HEMTs; Indium gallium arsenide; Linearity; MODFETs; PHEMTs; Transconductance; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Junction Technology, 2004. IWJT '04. The Fourth International Workshop on
Print_ISBN
0-7803-8191-2
Type
conf
DOI
10.1109/IWJT.2004.1306798
Filename
1306798
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