Complete management of implant misprocessing risk through computer automation

Author

Axan, B. ; Pivin, L. ; Irle, J.

Author_Institution

Motorola Inc., Mesa, AZ, USA

fYear

1996

fDate

16-21 Jun 1996

Firstpage

505

Lastpage

508

Abstract

The implant area of virtually every production fab has some degree of protection against wafers receiving wrong implants. Host computer control has been used to eliminate the possibility of wrong implants, missing implants, and double implants throughout the implant area in spite of limitations imposed by implanters with varying degrees of software capabilities and hardware configurations, i.e., serial versus batch processing. The development of three complete host computer systems for all MOS6 Varian implanters has resulted in a methodology which can be applied to any manufacturing area

Keywords

factory automation; ion implantation; process control; risk management; semiconductor device manufacture; MOS6 Varian implanter; computer automation; computer control; host computer system; ion implant misprocessing; risk management; semiconductor manufacturing; wafer processing; Automatic control; Computer aided manufacturing; Computer integrated manufacturing; Costs; Implants; Manufacturing automation; Manufacturing processes; Production; Risk management; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Ion Implantation Technology. Proceedings of the 11th International Conference on

Conference_Location

Austin, TX

Print_ISBN

0-7803-3289-X

Type

conf

DOI

10.1109/IIT.1996.586415

Filename

586415