• DocumentCode
    3098226
  • Title

    Compact modeling of silicon carbide lateral MOSFETs for extreme environment integrated circuits

  • Author

    Kashyap, Avinash S. ; Chen, Cheng-Po ; Tilak, Vinayak

  • Author_Institution
    Gen. Electr. Global Res. Center (GRC), Niskayuna, NY, USA
  • fYear
    2011
  • fDate
    7-9 Dec. 2011
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Silicon carbide (SiC) based semiconductor devices have been gaining tremendous traction in the last decade due to the inherent material advantages [1]. While most of the efforts in developing SiC devices are focused on discrete power semiconductors, a team at GE GRC is developing SiC based integrated circuits that can be used in extremely high temperature applications such as geothermal drilling, aviation electronics, space exploration etc. [2] This ability of SiC is attributed to its low intrinsic carrier concentration, due to which SiC based devices have leakage currents that are several orders of magnitude lower than their Si counterparts under high ambient temperatures.
  • Keywords
    MOSFET; high-temperature electronics; integrated circuit modelling; semiconductor device models; silicon compounds; GE GRC; aviation electronics; compact modeling; discrete power semiconductors; extreme-environment integrated circuits; extremely-high-temperature applications; geothermal drilling; leakage currents; low-intrinsic carrier concentration; silicon carbide lateral MOSFET; silicon carbide-based integrated circuits; space exploration; FETs; Integrated circuit modeling; Mathematical model; Silicon; Silicon carbide; Temperature; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium (ISDRS), 2011 International
  • Conference_Location
    College Park, MD
  • Print_ISBN
    978-1-4577-1755-0
  • Type

    conf

  • DOI
    10.1109/ISDRS.2011.6135185
  • Filename
    6135185