DocumentCode
3098226
Title
Compact modeling of silicon carbide lateral MOSFETs for extreme environment integrated circuits
Author
Kashyap, Avinash S. ; Chen, Cheng-Po ; Tilak, Vinayak
Author_Institution
Gen. Electr. Global Res. Center (GRC), Niskayuna, NY, USA
fYear
2011
fDate
7-9 Dec. 2011
Firstpage
1
Lastpage
2
Abstract
Silicon carbide (SiC) based semiconductor devices have been gaining tremendous traction in the last decade due to the inherent material advantages [1]. While most of the efforts in developing SiC devices are focused on discrete power semiconductors, a team at GE GRC is developing SiC based integrated circuits that can be used in extremely high temperature applications such as geothermal drilling, aviation electronics, space exploration etc. [2] This ability of SiC is attributed to its low intrinsic carrier concentration, due to which SiC based devices have leakage currents that are several orders of magnitude lower than their Si counterparts under high ambient temperatures.
Keywords
MOSFET; high-temperature electronics; integrated circuit modelling; semiconductor device models; silicon compounds; GE GRC; aviation electronics; compact modeling; discrete power semiconductors; extreme-environment integrated circuits; extremely-high-temperature applications; geothermal drilling; leakage currents; low-intrinsic carrier concentration; silicon carbide lateral MOSFET; silicon carbide-based integrated circuits; space exploration; FETs; Integrated circuit modeling; Mathematical model; Silicon; Silicon carbide; Temperature; Temperature measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium (ISDRS), 2011 International
Conference_Location
College Park, MD
Print_ISBN
978-1-4577-1755-0
Type
conf
DOI
10.1109/ISDRS.2011.6135185
Filename
6135185
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