DocumentCode
3099384
Title
Advanced 2D latch-up device simulation-a powerful tool during development in the pre-silicon phase
Author
Bargstadt-Franke, S. ; Oettinger, K.
Author_Institution
Infineon Technol. AG, Munchen, Germany
fYear
2001
fDate
2001
Firstpage
235
Lastpage
239
Abstract
The consideration of parasitic effects like the ESD and latch-up sensitivity of a new technology in the early development phase is not yet established. Calibrated 2D simulation can be used for optimizing the technology according to these parasitic effects yielding to an area optimized protection concept and thus offering the possibility to reduce chip costs. In this paper, we present a 2D latch-up device simulation developed for use in the pre-silicon phase to get an optimized pre-silicon latch-up concept for Infineon´s 0.13 μm technology. Silicon verification shows the excellent simulation quality
Keywords
CMOS integrated circuits; circuit CAD; circuit optimisation; circuit simulation; electrostatic discharge; integrated circuit design; product development; protection; semiconductor process modelling; sensitivity; technology CAD (electronics); 0.13 micron; 2D latch-up device simulation; 2D latch-up device simulation tool; CMOS technology; ESD sensitivity; SiO2-Si; area optimized protection concept; calibrated 2D simulation; chip costs; development phase; latch-up sensitivity; optimized pre-silicon latch-up concept; parasitic effects; pre-silicon development phase; pre-silicon phase; silicon verification; simulation quality; technology optimization; CMOS technology; Calibration; Cost function; Phase measurement; Protection; Safety; Silicon; Testing; Time measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 2001. Proceedings. 39th Annual. 2001 IEEE International
Conference_Location
Orlando, FL
Print_ISBN
0-7803-6587-9
Type
conf
DOI
10.1109/RELPHY.2001.922907
Filename
922907
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