• DocumentCode
    310864
  • Title

    Plasma Induced Charging Evaluation Using SCA And PDM Tools

  • Author

    Karzhavin, Yuri ; Lao, Keith ; Wu, Wei ; Gelatos, Carol

  • Author_Institution
    Motorola
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    143
  • Lastpage
    146
  • Keywords
    Antenna measurements; Current measurement; Etching; Plasma applications; Plasma devices; Plasma materials processing; Plasma measurements; Plasma sources; Resists; Thickness measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596722
  • Filename
    596722
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310864