DocumentCode

310886

Title

Effect Of Ion-bombardment Intensity Due To The Charging On Sidewall Trench Formatiom

Author

Lee, H.C. ; Beckx, S. ; Vanhaelemeersch, S.

Author_Institution

IMEC

fYear

1997

fDate

13-14 May 1997

Firstpage

225

Lastpage

228

Keywords

Bonding; Electrons; Etching; Fabrication; Fluid flow; Large Hadron Collider; Plasma applications; Resists; Silicon; Surface charging;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1997., 2nd International Symposium on

Conference_Location

Monterey, California, USA

Print_ISBN

0-9651-5771-7

Type

conf

DOI

10.1109/PPID.1997.596753

Filename

596753