DocumentCode

310891

Title

Degradation Of Silicon Dioxide Film Under High Electric Field Stress

Author

Yamabe, Kikuo

Author_Institution

University of Tsukuba

fYear

1997

fDate

13-14 May 1997

Firstpage

243

Lastpage

246

Keywords

Annealing; Degradation; Electric breakdown; Electrodes; Leakage current; MOS capacitors; Plasma temperature; Semiconductor films; Silicon compounds; Stress;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1997., 2nd International Symposium on

Conference_Location

Monterey, California, USA

Print_ISBN

0-9651-5771-7

Type

conf

DOI

10.1109/PPID.1997.596760

Filename

596760