DocumentCode
3112153
Title
2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432)
fYear
2000
fDate
17-22 Sept. 2000
Abstract
The following topics were discussed: processing and devices; implantation damage; annealing; modelling and simulation; SOI technology; implanter systems and components; low energy large area implantation; ion sources; charging; process control; contamination; safety and environmental effects; nonsemiconductor applications
Keywords
ion implantation; semiconductor doping; SOI technology; annealing; contamination; implantation damage; implanter systems; ion sources; low energy large area implantation; nonsemiconductor implantation; process control; semiconductor doping;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology, 2000. Conference on
Conference_Location
Alpbach
Print_ISBN
0-7803-6462-7
Type
conf
DOI
10.1109/IIT.2000.924078
Filename
924078
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