• DocumentCode
    3114730
  • Title

    Modifications to improve lifetime of the ELS ion source

  • Author

    Rathmeli, R.D. ; Hsieh, T.J. ; Trueira, F.R.

  • Author_Institution
    Axcelis Technol. Inc., Beverly, MA, USA
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    524
  • Lastpage
    526
  • Abstract
    The Extended Life Source, ELS, generally provides improved source life compared to the more commonly used Bernas source. The ELS source uses an indirectly heated cathode to keep the filament out of the arc chamber. Typical lifetime for NV-GSD sources running a mix of species in production has been about 100 to 300 hrs. Failure has often been associated with the cathode insulation, filament failures, or filament shorts. A new cathode assembly is discussed, which has allowed the source life to exceed 1300 hrs in production use on a NV-GSD/HE. Multiple-charged species are more challenging to produce and require high arc power to achieve useable currents. Requirements for 100 μA of He++ with a source life of at Least 100 hrs on the Axcelis 8250 implanter necessitated a factor of two increase in source life. A special ELS source was developed which uses a thicker cathode, tungsten repeller, and other modifications to tolerate high arc power to enhance He++ current. These modifications and their effect on performance is described
  • Keywords
    ion sources; life testing; 100 to 300 h; Axcelis 8250 implanter; He++ current; arc power; cathode insulation; extended life source; filament failures; filament shorts; indirectly heated cathode; ion source; multiple-charged species; Assembly; Cathodes; Coatings; Gas insulation; Helium; Ion sources; Production; Stress; Tungsten; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology, 2000. Conference on
  • Conference_Location
    Alpbach
  • Print_ISBN
    0-7803-6462-7
  • Type

    conf

  • DOI
    10.1109/.2000.924204
  • Filename
    924204