DocumentCode
3115592
Title
Vacuum actuated gas delivery
Author
Olander, W. Karl ; Donatucci, Matt ; Mayer, Jim ; Wang, Luping
Author_Institution
ATMI Inc., Danbury, CT, USA
fYear
2000
fDate
2000
Firstpage
722
Lastpage
725
Abstract
The new Vacuum Actuated Cylinder (VACTM) gas source provides sub-atmospheric pressure delivery of the metal fluorides commonly used as dopants for ion implant. The VAC gas source is a mechanical system based on an embedded pressure control device located inside the cylinder. A pre-set sub-atmospheric pressure must be achieved in the delivery manifold before flow is permitted from the cylinder. Even with the primary cylinder valve open, if the threshold activation pressure is not achieved, flow does not occur. This paper describes the VAC gas source technology, its operation and features that include improved safety and storage capacity. A detailed discussion of the testing procedures, results and future plans is also included
Keywords
flow control; gases; ion implantation; pressure control; safety; vacuum techniques; VAC gas source; Vacuum Actuated Cylinder gas source; delivery manifold; dopants; embedded pressure control device; ion implant; metal fluorides; pre-set sub-atmospheric pressure; primary cylinder valve; safety; storage capacity; sub-atmospheric pressure delivery; testing procedures; threshold activation pressure; vacuum actuated gas delivery; Assembly; Bellows; Fluid flow; Gases; Implants; Pressure control; Regulators; Safety; Testing; Valves;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology, 2000. Conference on
Conference_Location
Alpbach
Print_ISBN
0-7803-6462-7
Type
conf
DOI
10.1109/.2000.924255
Filename
924255
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