DocumentCode
3130383
Title
An in-depth study on the fabrication of 1055–1064 nm multi-quantum-well and super-lattice laser diodes
Author
Wu, A.H. ; Tseng, H.C. ; Hu, C. ; Wan, C.T. ; Su, Y.K. ; Tsau, S.
Author_Institution
Inst. of Electron., Kun Shan Univ., Taiwan
fYear
2009
fDate
21-23 Oct. 2009
Firstpage
100
Lastpage
103
Abstract
In this paper the InGaAs/GaAs multi-quantum-well as well as the AlGaAs/GaAs and the GaAsP/GaAs super-lattice material systems have been employed to develop 1055-1064 nm quantum-well laser diodes, including epitaxial growth and device fabrication technologies. The semiconductor-type seed laser can be used in the pulsed optical-fiber system. Extensive research efforts have been made to generate blue and green light directly from semiconductor laser diodes because of their various advantages such as low noise, high-frequency modulation capability, wavelength tunability, compactness, and easy integration. Because the low-cost GaAs substrate was adopted, it is expected that the manufacturing expense of the optical communication network will be reduced as well as the lasing performance will be excellent, and it is very helpful for the future global optical-fiber platform implementation.
Keywords
III-V semiconductors; MOCVD; epitaxial growth; gallium arsenide; indium compounds; optical fabrication; quantum well lasers; InGaAs-GaAs; blue light; epitaxial growth; green light; metalorganic chemical vapour deposition; multi-quantum-well laser diodes; pulsed optical-fiber system; super-lattice laser diodes; wavelength 1055 nm to 1064 nm; Diode lasers; Gallium arsenide; Indium gallium arsenide; Optical device fabrication; Optical materials; Optical modulation; Optical noise; Quantum well lasers; Semiconductor diodes; Semiconductor materials;
fLanguage
English
Publisher
ieee
Conference_Titel
Microsystems, Packaging, Assembly and Circuits Technology Conference, 2009. IMPACT 2009. 4th International
Conference_Location
Taipei
Print_ISBN
978-1-4244-4341-3
Electronic_ISBN
978-1-4244-4342-0
Type
conf
DOI
10.1109/IMPACT.2009.5382170
Filename
5382170
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