• DocumentCode
    3134180
  • Title

    High electron mobility in heavily doped bases of InP/GaInAs HBTs

  • Author

    Betser, Y. ; Ritter, D.

  • Author_Institution
    Dept. of Electr. Eng., Technion-Israel Inst. of Technol., Haifa, Israel
  • fYear
    1995
  • fDate
    9-13 May 1995
  • Firstpage
    452
  • Lastpage
    455
  • Abstract
    The minority carrier electron mobility in the base of InP/GaInAs HBTs was measured as a function of temperature using a new magneto transport method. At room temperature the mobility was found to be as high as 3400 cm2 V-1 sec-1 at a base doping level of 3.4×1019 cm-3. The measured mobility was compared with calculations carried out using the dielectric function formalism. The dominant scattering mechanisms are ionized impurity scattering and coupled LO phonon-plasmon scattering. The calculations correctly predict the high temperature mobility. At low temperatures a Monte Carlo analysis must be performed to model the experimental results because the electron distribution is nonthermal. The momentum relaxation rate strongly depends on the electron energy due to the elastic nature of the coupled LO phonon-plasmon scattering at low electron energy
  • Keywords
    electron mobility; gallium arsenide; heavily doped semiconductors; heterojunction bipolar transistors; impurity scattering; indium compounds; magnetoresistance; minority carriers; phonon-plasmon interactions; semiconductor device models; InP; InP/GaInAs HBTs; Monte Carlo analysis; coupled LO phonon-plasmon scattering; dielectric function formalism; heavily doped bases; high electron mobility; high temperature mobility; ionized impurity scattering; magneto transport method; minority carrier electron mobility; momentum relaxation rate; nonthermal electron distribution; scattering mechanisms; Dielectric measurements; Doping; Electron mobility; Gain measurement; Impurities; Indium phosphide; Monte Carlo methods; Performance analysis; Scattering; Temperature distribution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on
  • Conference_Location
    Hokkaido
  • Print_ISBN
    0-7803-2147-2
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1995.522177
  • Filename
    522177