• DocumentCode
    313724
  • Title

    Modeling and filtering of optical emission spectroscopy. Data for plasma etching systems

  • Author

    Rangan, Sundeep ; Spanos, Costas ; Poolla, Kameshwar

  • Author_Institution
    Dept. of Electr. Eng., California Univ., Berkeley, CA, USA
  • Volume
    1
  • fYear
    1997
  • fDate
    4-6 Jun 1997
  • Firstpage
    627
  • Abstract
    We present a novel filter for optical emission spectroscopy (OES) data in plasma etch control applications. The filter is based on principal component analysis and jump linear filtering. The filter is demonstrated on a commercial multilayer TiN/Al(0.5% Cu)/TiN/SiO2 etch process
  • Keywords
    optical filters; plasma diagnostics; sputter etching; TiN-AlCu-TiN-SiO2; TiN/AlCu/TiN/SiO2 multilayer; jump linear filtering; model; optical emission spectroscopy; plasma etching control; principal component analysis; Etching; Filtering; Nonlinear filters; Optical control; Optical filters; Plasma applications; Principal component analysis; Spectroscopy; Stimulated emission; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    American Control Conference, 1997. Proceedings of the 1997
  • Conference_Location
    Albuquerque, NM
  • ISSN
    0743-1619
  • Print_ISBN
    0-7803-3832-4
  • Type

    conf

  • DOI
    10.1109/ACC.1997.611875
  • Filename
    611875
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=313724