• DocumentCode
    3138633
  • Title

    In-situ observation of As/P exchange reaction and As carryover in InAs/InP quantum well structures by surface photoabsorption

  • Author

    Hwang, Heedon ; Lee, Tae-Wan ; Moon, Youngboo ; Yoon, Euijoon ; Kim, Young Dong

  • Author_Institution
    Sch. of Mater. Sci. & Eng., Seoul Nat. Univ., South Korea
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    268
  • Lastpage
    271
  • Abstract
    InAs/InP quantum well structures were grown by low pressure metal organic chemical vapor deposition. During the growth, the As/P exchange reaction and As carryover were monitored in-situ by surface photoabsorption. We simulated the measured SPA signal using a multilayer model and effective medium theory to obtain the As compositional profile which was carried over into the InP layer
  • Keywords
    III-V semiconductors; MOCVD; chemical exchanges; indium compounds; photoluminescence; semiconductor epitaxial layers; semiconductor growth; semiconductor quantum wells; vapour phase epitaxial growth; visible spectra; As carryover; As compositional profile; As/P exchange reaction; InAs-InP; effective medium theory; low pressure MOCVD; multilayer model; quantum well structures; surface photoabsorption; Application specific processors; Ash; Chemical vapor deposition; Electrons; Indium phosphide; Monitoring; Nonhomogeneous media; Organic chemicals; Strain control; X-ray diffraction;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronic and Microelectronic Materials Devices, 1998. Proceedings. 1998 Conference on
  • Conference_Location
    Perth, WA
  • Print_ISBN
    0-7803-4513-4
  • Type

    conf

  • DOI
    10.1109/COMMAD.1998.791638
  • Filename
    791638