• DocumentCode
    3139777
  • Title

    The deposition and processing of thin film ceramics

  • Author

    Blamire, M.G.

  • Author_Institution
    Dept. of Mater. Sci., Cambridge Univ., UK
  • fYear
    1997
  • fDate
    35748
  • Firstpage
    42401
  • Lastpage
    42402
  • Abstract
    The deposition and processing of thin film ceramics is an area of rapid technological development. Applications include piezoelectric sensors and devices, high dielectric capacitors, high temperature superconductors. and a variety of materials aimed at the uncooled thermal imager market. By comparison with metals and semiconductors, electroceramics are difficult to deposit in a form which can deliver the bulk properties of the material; for instance PZT which has desirable piezoelectric and ferroelectric properties in bulk, but has required extensive process development to achieve even modest properties in thin film form. This presentation will summarise the various deposition processes which have been developed to improve the qualities and cost-effectiveness of thin film electroceramics and identify areas of current development
  • Keywords
    piezoceramics; CVD; cost-effectiveness; electroceramics; film deposition; film integration; film microstructure; laser ablation; piezoceramics; processing; sputter deposition; thin film ceramics;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Electro-technical Ceramics - Processing, Properties and Applications (Ref. No: 1997/317), IEE Colloquium on
  • Conference_Location
    London
  • Type

    conf

  • DOI
    10.1049/ic:19971049
  • Filename
    660638