DocumentCode
3139777
Title
The deposition and processing of thin film ceramics
Author
Blamire, M.G.
Author_Institution
Dept. of Mater. Sci., Cambridge Univ., UK
fYear
1997
fDate
35748
Firstpage
42401
Lastpage
42402
Abstract
The deposition and processing of thin film ceramics is an area of rapid technological development. Applications include piezoelectric sensors and devices, high dielectric capacitors, high temperature superconductors. and a variety of materials aimed at the uncooled thermal imager market. By comparison with metals and semiconductors, electroceramics are difficult to deposit in a form which can deliver the bulk properties of the material; for instance PZT which has desirable piezoelectric and ferroelectric properties in bulk, but has required extensive process development to achieve even modest properties in thin film form. This presentation will summarise the various deposition processes which have been developed to improve the qualities and cost-effectiveness of thin film electroceramics and identify areas of current development
Keywords
piezoceramics; CVD; cost-effectiveness; electroceramics; film deposition; film integration; film microstructure; laser ablation; piezoceramics; processing; sputter deposition; thin film ceramics;
fLanguage
English
Publisher
iet
Conference_Titel
Electro-technical Ceramics - Processing, Properties and Applications (Ref. No: 1997/317), IEE Colloquium on
Conference_Location
London
Type
conf
DOI
10.1049/ic:19971049
Filename
660638
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